US 12,128,450 B2
Back nozzle unit and apparatus for processing a substrate including back nozzle unit
Junhyun Lim, Seoul (KR); Yunseok Jeon, Cheonan-si (KR); Gilhun Song, Cheonan-si (KR); and Junkee Kang, Cheonan-si (KR)
Assigned to SEMES CO., LTD, Cheonan-si (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Aug. 3, 2021, as Appl. No. 17/392,389.
Claims priority of application No. 10-2020-0187302 (KR), filed on Dec. 30, 2020.
Prior Publication US 2022/0203408 A1, Jun. 30, 2022
Int. Cl. B08B 3/02 (2006.01); F26B 3/04 (2006.01); B08B 5/02 (2006.01); H01L 21/67 (2006.01)
CPC B08B 3/02 (2013.01) [F26B 3/04 (2013.01); B08B 5/02 (2013.01); H01L 21/67051 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A back nozzle unit comprising:
a skirt disposed under a bottom face of a substrate;
at least one back nozzle protruding from the skirt and providing a cleaning solution onto the bottom face of the substrate; and
a gas supply nozzle protruding from the skirt and providing a gas onto the bottom face of the substrate,
wherein the skirt includes a body and a plurality of flow paths being formed in the body and providing a gas toward the bottom face of the substrate.