US 12,128,395 B2
Process apparatus including gas supplier and method of operating the same
Dongsik Yang, Seoul (KR); Hyukjae Kwon, Suwon-si (KR); Minseok Koo, Suwon-si (KR); Sukeun Kuk, Suwon-si (KR); Sehyeong Oh, Seoul (KR); Hyun Chul Lee, Hwaseong-si (KR); and Sangmin Ji, Yongin-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-Do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Aug. 25, 2021, as Appl. No. 17/411,640.
Claims priority of application No. 10-2021-0015650 (KR), filed on Feb. 3, 2021.
Prior Publication US 2022/0243334 A1, Aug. 4, 2022
Int. Cl. C23C 16/52 (2006.01); B01J 7/00 (2006.01); C23C 16/448 (2006.01); H01L 21/67 (2006.01)
CPC B01J 7/00 (2013.01) [C23C 16/448 (2013.01); C23C 16/4481 (2013.01); H01L 21/67017 (2013.01); H01L 21/67253 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A process apparatus comprising:
a gas supplier which supplies a reaction gas having a constant concentration, the gas supplier including:
a reactor which accommodates a solid phase reactant;
a heater which applies heat to the solid phase reactant to convert the solid phase reactant to the reaction gas in a gas phase;
a gas pump which applies a predetermined pumping pressure to the reactor; and
a gas outlet which discharges the reaction gas; and
a processor which performs a predetermined process by the reaction gas supplied from the gas outlet of the gas supplier to the processor.