US 12,456,849 B1
Semiconductor waveguide optical gain device with lateral current confinement or optical mode shaping
Henry A. Blauvelt, San Marino, CA (US); and Wei Hsin, Arcadia, CA (US)
Assigned to HieFo Corporation, Alhambra, CA (US)
Filed by HieFo Corporation, Alhambra, CA (US)
Filed on Feb. 19, 2025, as Appl. No. 19/057,911.
Application 19/057,911 is a division of application No. 18/957,531, filed on Nov. 22, 2024.
Int. Cl. H01S 5/22 (2006.01); H01S 5/223 (2006.01); H01S 5/227 (2006.01)
CPC H01S 5/2205 (2013.01) [H01S 5/22 (2013.01); H01S 5/223 (2013.01); H01S 5/2231 (2013.01); H01S 5/227 (2013.01)] 23 Claims
OG exemplary drawing
 
1. An optical device comprising:
(a) a substrate;
(b) a bottom doped semiconductor layer on the substrate;
(c) a top doped semiconductor layer on the bottom doped layer so that the bottom doped layer is between the substrate and the top doped layer, the top and bottom doped layers being of opposite n- or p-doping types;
(d) a semiconductor active layer between the top and bottom doped layers, the active layer being arranged so as to emit light and exhibit optical gain at a nominal optical wavelength λ0 through radiative recombination of charge carriers at the active layer resulting from forward-biased drive current flowing between the top and bottom doped layers through the active layer;
(e) an optical waveguide structure including an optical gain section, the optical waveguide structure (i) defining lateral and longitudinal directions parallel to the top and bottom doped layers, (ii) supporting one or more optical modes that spatially overlap portions of the bottom doped, top doped, and active layers in the optical gain section, and (iii) being arranged as a planar-buried-rib waveguide (PBRWG) structure that includes a central longitudinal strip of higher-index semiconductor material on the active layer, the higher-index semiconductor material having a refractive index higher than refractive indices of the top and bottom doped layers;
(f) a pair of longitudinal, laterally spaced-apart strips of higher-index semiconductor material positioned along the PBRWG structure, the higher-index semiconductor material having a refractive index higher than refractive indices of the top and bottom doped layers, arrangement of the spaced-apart strips resulting in a corresponding optical intensity lateral profile across the active layer of a selected one of the one or more of the optical modes, the optical intensity lateral profile having a higher fraction of optical intensity within its full width at half maximum intensity (FWHM) compared to a corresponding mode of an otherwise identical reference PBRWG structure that lacks the spaced-apart strips; and
(g) one or more drive current structures that define a drive current path along which the drive current flows through the active layer in the optical gain section, the one or more drive current structures including one or more current restrictors that are formed from lateral current-blocking layers that (i) extend laterally between the top and active layers, (ii) extend medially at least partly across the central longitudinal strip, and (iii) are arranged to form a longitudinal gap therebetween or therethrough, the gap being positioned along the PBRWG structure and filled with doped semiconductor material, the one or more current restrictors being arranged so as to constrain the drive current to flow through the gap, width of the gap being less than width of the central longitudinal strip of the PBRWG structure,
(h) wherein the optical waveguide structure, the one or more drive current structures, or both, are positioned and arranged to result in a selected degree of spatial overlap between (i) a drive current lateral profile across the active layer in the optical gain section and (ii) the corresponding optical intensity lateral profile across the active layer in the optical gain section of the selected one of the one or more optical modes.