US 12,456,705 B2
First layer interconnect first on carrier approach for EMIB patch
Changhua Liu, Chandler, AZ (US); Xiaoying Guo, Phoenix, AZ (US); Aleksandar Aleksov, Chandler, AZ (US); Steve S. Cho, Chandler, AZ (US); Leonel Arana, Phoenix, AZ (US); Robert May, Chandler, AZ (US); and Gang Duan, Chandler, AZ (US)
Assigned to Intel Corporation, Santa Clara, CA (US)
Filed by Intel Corporation, Santa Clara, CA (US)
Filed on Jul. 2, 2021, as Appl. No. 17/366,469.
Application 17/366,469 is a continuation of application No. 16/646,084, granted, now 11,088,103, previously published as PCT/US2018/013620, filed on Jan. 12, 2018.
Prior Publication US 2021/0343673 A1, Nov. 4, 2021
Int. Cl. H01L 23/00 (2006.01)
CPC H01L 24/20 (2013.01) [H01L 24/11 (2013.01); H01L 24/13 (2013.01); H01L 24/19 (2013.01); H01L 2224/11622 (2013.01); H01L 2224/214 (2013.01); H01L 2224/215 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A semiconductor package, comprising:
a first bridge die having a top, a bottom, a first side between the top and bottom, and a second side between the top and bottom, the second side opposite the first side, the first bridge die having a vertical thickness between the top and bottom;
a second bridge die laterally spaced apart from the first bridge die, the second bridge die having a top, a bottom, a first side between the top and bottom, and a second side between the top and bottom, the second side opposite the first side, the second bridge die having a vertical thickness between the top and bottom;
a core material laterally adjacent to and in contact with the first side and the second side of the first bridge die, and the core material laterally adjacent to and in contact with the first side and the second side of the second bridge die;
a first conductive pillar laterally adjacent to the first side of the first bridge die, wherein a first portion of the core material is between the first conductive pillar and the first side of the first bridge die, the first portion of the core material in contact with the first conductive pillar, wherein the first conductive pillar has a vertical thickness greater than the vertical thickness of the first bridge die, and wherein the vertical thickness of the first conductive pillar extends along an entirety of the vertical thickness of the first bridge die to a first location below the bottom of the first bridge die;
a second conductive pillar laterally adjacent to the second side of the first bridge die, wherein a second portion of the core material is between the second conductive pillar and the second side of the first bridge die, the first portion of the core material in contact with the first conductive pillar, wherein the second conductive pillar has a vertical thickness greater than the vertical thickness of the first bridge die, and wherein the vertical thickness of the second conductive pillar extends along an entirety of the vertical thickness of the first bridge die to a second location below the bottom of the first bridge die;
a third conductive pillar laterally spaced apart from the first conductive pillar, the third conductive pillar in contact with the core material;
a build-up layer over the core material, the build-up layer over the first bridge die, over the second bridge die, over the first conductive pillar, over the second conductive pillar, and over the third conductive pillar, the build-up layer vertically overlapping with the third conductive pillar, and the build-up layer having an uppermost surface;
a first die over a first portion of the build-up layer, the first die coupled to the first bridge die and to the first conductive pillar by a first plurality of microbumps and the first portion of the build-up layer, and the first die having a bottommost surface above the uppermost surface of the build-up layer, wherein the first bridge die is partially within a footprint of the first die;
a second die over a second portion of the build-up layer, the second die coupled to the first bridge die and to the second conductive pillar by a second plurality of microbumps and the second portion of the build-up layer, the second die electrically coupled to the first die by the first bridge die, and the second die having a bottommost surface above the uppermost surface of the build-up layer, wherein the third conductive pillar is at least partially outside of a footprint of the second die and the first die, wherein the first bridge die is partially within a footprint of the second die, and the second bridge die is partially within the footprint of the second die;
a first interconnect coupled directly to the first conductive pillar on a side of the first conductive pillar opposite the first die, the first interconnect in vertical alignment with the first conductive pillar;
a second interconnect coupled directly to the second conductive pillar on a side of the second conductive pillar opposite the second die, the second interconnect in vertical alignment with the second conductive pillar; and
a third interconnect coupled directly to the third conductive pillar on a side of the third conductive pillar opposite the first die and the second die, the third interconnect in vertical alignment with the third conductive pillar.