US 12,456,637 B2
Substrate processing apparatus and substrate processing method
Youngjun Son, Cheonan-si (KR); and Taehoon Lee, Osan-si (KR)
Assigned to Semes Co., Ltd., Cheonan-si (KR)
Filed by Semes Co., Ltd., Cheonan-si (KR)
Filed on Mar. 29, 2023, as Appl. No. 18/192,246.
Claims priority of application No. 10-2022-0041919 (KR), filed on Apr. 4, 2022.
Prior Publication US 2023/0317477 A1, Oct. 5, 2023
Int. Cl. H01L 21/67 (2006.01); H01L 21/027 (2006.01)
CPC H01L 21/6715 (2013.01) [H01L 21/027 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a substrate supporter supporting a substrate; and
a processing solution supply apparatus configured to supply a processing solution onto the substrate supported on the substrate supporter,
wherein the processing solution supply apparatus comprises:
a trap tank storing the processing solution;
a supply line connected to the trap tank to supply the processing solution onto the substrate;
a first vent line connected to the trap tank to discharge the processing solution including bubbles or gases from the trap tank; and
a first static charge measurement unit connected to the first vent line to measure a static charge of the processing solution, and comprising a first Faraday cup and a first static charge measurement unit connected to the first Faraday cup.