US 12,456,611 B2
Systems and methods for controlling a voltage waveform at a substrate during plasma processing
Leonid Dorf, San Jose, CA (US); James Hugh Rogers, Los Gatos, CA (US); Olivier Luere, Sunnyvale, CA (US); Travis Koh, Sunnyvale, CA (US); Rajinder Dhindsa, Pleasanton, CA (US); and Sunil Srinivasan, Milpitas, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed on Jun. 8, 2017, as Appl. No. 15/618,082.
Claims priority of provisional application 62/349,383, filed on Jun. 13, 2016.
Prior Publication US 2017/0358431 A1, Dec. 14, 2017
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32706 (2013.01) [H01J 37/32146 (2013.01); H01J 37/32715 (2013.01); H01J 37/32935 (2013.01); H01J 37/3299 (2013.01); H01J 2237/334 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A plasma processing system, comprising:
a substrate support defining a surface for supporting a substrate to be processed, the substrate support including an electrostatic chuck comprising a chucking pole, and an electrode, wherein the electrode and the chucking pole are disposed in a layer of dielectric material and are separated from the substrate support surface by respective portions of the layer of dielectric material;
a plasma, disposed above the substrate support surface;
a sensor capturing a signal representative of a voltage at a substrate positioned
on the substrate support surface;
a bias supply providing a shaped pulse bias waveform to the chucking pole;
a controller receiving the captured signal from the sensor and generating a control signal to be communicated to the bias supply to adjust the shaped pulse bias waveform based on the captured signal; and
wherein the chucking pole is located in the layer of dielectric material such that a thickness of a portion of the layer of dielectric material between the chucking pole and the substrate support surface is at least ten times less than a thickness of a portion of the layer of dielectric material between the electrode and the substrate support surface.