US 12,456,598 B2
Charged particle beam apparatus
Takayasu Iwatsuka, Tokyo (JP); Hideto Dohi, Tokyo (JP); Tomoyo Sasaki, Tokyo (JP); and Wen Li, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
Filed on May 22, 2023, as Appl. No. 18/200,232.
Claims priority of application No. 2022-110340 (JP), filed on Jul. 8, 2022.
Prior Publication US 2024/0014002 A1, Jan. 11, 2024
Int. Cl. H01J 37/24 (2006.01); H01J 37/14 (2006.01); H01J 37/147 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/244 (2013.01) [H01J 37/1475 (2013.01); H01J 37/28 (2013.01); H01J 2237/24455 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/24521 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A charged particle beam apparatus comprising:
a charged particle source generating a charged particle beam;
a deflector deflecting the charged particle beam;
a detector detecting secondary electrons emitted from an irradiation target in response to irradiation with the charged particle beam; and
a processor system, wherein
the processor system
(A) acquires a first time-series change in secondary electron detection-related quantity by repeatedly performing the following (A1) and (A2),
(A1) directly or indirectly maintains or changes a control amount applied to the deflector to a first control amount, and
(A2) acquires the secondary electron detection-related quantity based on an output from the detector, and
(B) acquires a time-series change in variation of the beam diameter of the charged particle beam based on the first time-series change.