US 12,455,508 B2
Nanolithography using pulsed laser direct writing
Xiaoming Yu, Orlando, FL (US); and Boyang Zhou, Orlando, FL (US)
Assigned to University of Central Florida Research Foundation, Inc., Orlando, FL (US)
Filed by University of Central Florida Research Foundation, Inc., Orlando, FL (US)
Filed on Feb. 6, 2023, as Appl. No. 18/106,338.
Claims priority of provisional application 63/306,690, filed on Feb. 4, 2022.
Prior Publication US 2023/0251577 A1, Aug. 10, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70025 (2013.01) 31 Claims
OG exemplary drawing
 
1. A laser patterning method comprising:
fabricating one or more precursor sites on a sample;
generating an illumination beam including one or more pulse bursts, each pulse burst including two or more laser pulses; and
scanning the illumination beam across the sample along a scan pattern including locations of the one or more precursor sites, wherein at least one of intensities, temporal inter-pulse spacings, or spatial overlap between the two or more laser pulses in the illumination beam are selected to selectively excite the one or more precursor sites to selectively modify the sample at the one or more precursor sites to form one or more patterned features, wherein a dimension of at least one feature in the one or more patterned features along at least one dimension is smaller than a size of the illumination beam on the sample.