US 12,455,254 B2
Electrical impedance measurement using an electron beam
Alex Goldenshtein, Ness Ziona (IL); and Dan Tuvia Fuchs, Rehovot (IL)
Assigned to Applied Materials Israel Ltd., Rehovot (IL)
Filed by APPLIED MATERIALS ISRAEL LTD., Rehovot (IL)
Filed on Nov. 9, 2022, as Appl. No. 17/984,041.
Prior Publication US 2024/0151669 A1, May 9, 2024
Int. Cl. G01N 27/02 (2006.01)
CPC G01N 27/021 (2013.01) [G01N 27/028 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A charged particle system for evaluating an impedance related value of a structure of a sample, the charged particle system comprising:
an imager; and
an impedance circuit;
wherein the imager is configured to:
perform a first illumination iteration that comprises charging the structure, using an electron beam, with an illumination iteration charge; wherein the structure is three dimensional and of microscopic scale; and
perform a second illumination iteration that comprises imaging the structure, using the electron beam, to provide an image of the structure; wherein there is a time difference between the first illumination iteration and the second illumination iteration; wherein a value of the illumination iteration charge and a value of the time difference between the first illumination iteration and the second illumination iteration are determined to introduce a dependency between an impedance of the structure and the image of the structure; and
wherein the impedance circuit is configured to:
determine the impedance related value of the structure based on the image of the structure, wherein the impedance related value of the structure is selected out of three or more different impedance related values.