| CPC G01B 11/005 (2013.01) [B25J 9/1694 (2013.01); B25J 9/1697 (2013.01); G01B 11/002 (2013.01); G01B 11/007 (2013.01); G01B 11/14 (2013.01); G01B 11/26 (2013.01); G01B 21/047 (2013.01)] | 21 Claims |

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1. A metrology system for use with a movement system that moves an end tool,
the movement system comprising:
a movable configuration comprising an end tool mounting configuration that an end tool is configured to mount to; and
a motion control system configured to control an end tool position and orientation, based at least in part on controlling the movable configuration so as to move at least a portion of an end tool that is mounted to the end tool mounting configuration within a movement volume,
the metrology system comprising:
a sensor configuration comprising a plurality of light beam sensors located at fixed positions;
a light beam source configuration that is configured to direct light beams to light beam sensors of the sensor configuration to indicate a position and orientation of the light beam source configuration, wherein:
the light beam source configuration is configured to be coupled to at least one of an end tool or the end tool mounting configuration;
at least some light beams that are directed toward the light beam sensors are configured to produce measurement spots in positions on the light beam sensors that cause the light beam sensors to produce corresponding measurement signals; and
a processing portion configured to process measurement signals from the light beam sensors of the sensor configuration to determine a position and orientation of the light beam source configuration,
wherein as part of a first operating mode, during which the movement system is configured to move the end tool and correspondingly the light beam source configuration to a plurality of positions, for each position the metrology system is configured to:
determine a region of interest for each light beam sensor of a set of light beam sensors, wherein each region of interest includes a measurement spot produced by a light beam from the light beam source configuration;
process measurement signals resulting from the regions of interest of the light beam sensors; and
determine a position and orientation of the light beam source configuration based at least in part on the processed measurement signals.
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