US 12,454,769 B2
Multizone lamp control and individual lamp control in a lamphead
Yi-Chiau Huang, Fremont, CA (US); and Errol Antonio C. Sanchez, Tracy, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Aug. 1, 2019, as Appl. No. 16/529,066.
Claims priority of provisional application 62/714,159, filed on Aug. 3, 2018.
Prior Publication US 2020/0045776 A1, Feb. 6, 2020
Int. Cl. C30B 25/10 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/48 (2006.01); C23C 16/52 (2006.01); C30B 25/16 (2006.01); H01L 21/67 (2006.01)
CPC C30B 25/105 (2013.01) [C23C 16/4585 (2013.01); C23C 16/46 (2013.01); C23C 16/482 (2013.01); C30B 25/16 (2013.01); H01L 21/67115 (2013.01); C23C 16/45504 (2013.01); C23C 16/52 (2013.01); H01L 21/67248 (2013.01); H01L 21/67288 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate processing apparatus, comprising:
a process chamber;
a substrate support disposed inside the process chamber;
a plurality of lamps arranged in a lamphead and positioned proximate to the substrate support, the plurality of lamps forming a plurality of lamp zones comprising at least an inner zone and an outer zone, the outer zone corresponding to a perimeter of the substrate support;
an inlet gas port configured to direct a gas in a lateral flow path across the substrate support to an exit gas port, the lateral flow path defining a leading edge of the substrate support and a trailing edge of the substrate support; and
a controller configured to differentially adjust power to the plurality of lamp zones and heat the substrate support in a non-uniform manner to create a temperature differential across the substrate support before a substrate is positioned on the substrate support by providing power to a portion of the lamps in the outer zone while providing a lower power level to other lamps in the outer zone.