| CPC C30B 23/025 (2013.01) [C30B 29/36 (2013.01)] | 30 Claims |

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1. A seed structure for a silicon carbide crystal growth system, wherein the seed structure comprises:
a carrier layer, the carrier layer comprising silicon carbide; and
a seed layer bonded to the carrier layer with a bond, wherein the seed layer comprises crystalline silicon carbide, wherein the bond comprises an electrostatic interaction at an interface between the carrier layer and the seed layer;
wherein the seed layer provides a growth surface for growing a crystalline silicon carbide structure in a silicon carbide crystal growth process.
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