	US 12,454,405 B2
	Chemical liquid and chemical liquid storage body
Tetsuya Kamimura, Haibara-gun (JP); Satomi Takahashi, Haibara-gun (JP); Tadashi Oomatsu, Haibara-gun (JP); and Tetsuya Shimizu, Haibara-gun (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on May 24, 2024, as Appl. No. 18/673,409.
Application 18/673,409 is a division of application No. 17/139,045, filed on Dec. 31, 2020, granted, now 12,030,713.
Application 17/139,045 is a continuation of application No. PCT/JP2019/026947, filed on Jul. 8, 2019.
Claims priority of application No. 2018-131747 (JP), filed on Jul. 11, 2018.
Prior Publication US 2024/0317485 A1, Sep. 26, 2024
Int. Cl. B65D 85/00 (2006.01); B65D 25/14 (2006.01); B65D 81/26 (2006.01); G03F 7/32 (2006.01); G03F 7/00 (2006.01)

CPC B65D 85/70 (2013.01) [B65D 25/14 (2013.01); B65D 81/26 (2013.01); G03F 7/32 (2013.01); G03F 7/325 (2013.01); G03F 7/0012 (2013.01)]

18 Claims

1. A method for producing a pattern using a resist composition and a chemical liquid comprising,

a step of applying the chemical liquid to a substrate,

a step of forming a resist film by applying the resist composition to the substrate,

a step of exposing the resist film using an EUV exposure machine, and

a step of developing the resist film to form the pattern, and

wherein the chemical liquid comprises one or more organic solvents selected from the group consisting of decane, undecane, and a compound other than an alkane and an alkene; and

one or more organic solvents selected from the group consisting of decane and undecane, and

one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and

wherein a content of the organic components is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.