| CPC B23K 26/382 (2015.10) [B23K 26/0622 (2015.10); B23K 26/082 (2015.10); B23K 26/703 (2015.10); B23K 2103/54 (2018.08)] | 20 Claims |

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1. A method comprising:
scanning a beam of laser energy along a process trajectory to form a via in a workpiece,
wherein the process trajectory defines a sequence of spot locations to be addressed upon irradiating the workpiece with a plurality of laser pulses during formation of the via,
wherein the workpiece comprises an electrical conductor structure in thermal contact with a dielectric structure,
wherein the electrical conductor structure is positioned between a source of the beam of laser energy and the dielectric structure,
wherein characteristics of the beam of laser energy and the scanning are such that laser energy delivered to the spot locations:
a) heat a first region of the electrical conductor structure such that heat accumulating within the first region of the electrical conductor structure is transferred to the dielectric structure to vaporize a first region of the dielectric structure to create a pocket beneath the first region of the electrical conductor structure,
wherein the pocket comprises a high-pressure region between the first region of the dielectric structure and a first region of the electrical conductor structure, and
b) further heats the first region of the electrical conductor structure above the pocket such that the high pressure region ejects at least a portion of the heated first region of the electrical conductor structure from the workpiece.
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