US 12,127,325 B2
Systems, devices, and methods for secondary particle suppression from a charge exchange device
Artem N. Smirnov, Mission Viejo, CA (US); Vladislav Vekselman, Lake Forest, CA (US); Vladimir I. Davydenko, Novosibirsk (RU); Alexandr A. Ivanov, Novosibirsk (RU); Michael Meekins, Silverado, CA (US); and Blake Koop, Jr., Laguna Hills, CA (US)
Assigned to TAE TECHNOLOGIES, INC., Foothill Ranch, CA (US)
Filed by TAE TECHNOLOGIES, INC., Foothill Ranch, CA (US)
Filed on Apr. 8, 2021, as Appl. No. 17/225,725.
Claims priority of provisional application 63/007,612, filed on Apr. 9, 2020.
Prior Publication US 2021/0345476 A1, Nov. 4, 2021
Int. Cl. H05H 3/06 (2006.01)
CPC H05H 3/06 (2013.01) 14 Claims
OG exemplary drawing
 
1. A system, comprising:
a charge exchange device having an inlet, a lumen fillable with a gas adapted to convert an incoming negative particle beam to a positive particle beam, and an outlet; and
an aperture structure located in close proximity with the inlet, wherein the aperture structure has an annular shape with an inner aperture sized to permit passage of the incoming negative particle beam when in an aligned state, and wherein the aperture structure is configured to at least partially shield the charge exchange device when the incoming negative particle beam is in a misaligned state.