US 12,125,676 B2
Plasma processing apparatus and plasma processing method
Takahiro Takeuchi, Miyagi (JP); and Ken Kobayashi, Miyagi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Jul. 21, 2023, as Appl. No. 18/224,749.
Application 18/224,749 is a continuation of application No. 17/475,909, filed on Sep. 15, 2021, granted, now 11,756,767.
Claims priority of application No. 2020-154843 (JP), filed on Sep. 15, 2020.
Prior Publication US 2023/0360884 A1, Nov. 9, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32146 (2013.01) [H01J 37/32183 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A plasma processing apparatus comprising:
a chamber;
a first matching circuit coupled to the chamber;
a second matching circuit coupled to the chamber;
a first RF generator coupled to the first matching circuit, and configured to generate a first RF pulsed signal including a plurality of first pulse cycles, each first pulse cycle including a first period, a second period, and a third period, and the first RF pulsed signal having a first power level in the first period, a second power level in the second period, and a third power level in the third period;
a second RF generator coupled to the second matching circuit, and configured to generate a second RF pulsed signal including a plurality of second pulse cycles, each second pulse cycle including a fourth period and a fifth period, the second RF pulsed signal having a frequency lower than a frequency of the first RF pulsed signal and having a fourth power level in the fourth period and a fifth power level in the fifth period, and the fourth period being set not to overlap with the first period; and
a third RF generator coupled to the second matching circuit, and configured to generate a third RF pulsed signal including a plurality of third pulse cycles, each third pulse cycle including a sixth period and a seventh period, the third RF pulsed signal having a frequency lower than the frequency of the second RF pulsed signal and having a sixth power level in the sixth period and a seventh power level in the seventh period, and the sixth period being set not to overlap with the first period and the fourth period.