US 12,124,174 B2
Metrology method and apparatus, computer program and lithographic system
Paul Jonathan Turner, Veldhoven (NL); and Anagnostis Tsiatmas, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/438,994
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Feb. 17, 2020, PCT No. PCT/EP2020/054087
§ 371(c)(1), (2) Date Sep. 14, 2021,
PCT Pub. No. WO2020/187514, PCT Pub. Date Sep. 24, 2020.
Claims priority of application No. 19171061 (EP), filed on Apr. 25, 2019.
Prior Publication US 2022/0155694 A1, May 19, 2022
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70633 (2013.01) 20 Claims
OG exemplary drawing
 
1. A method comprising:
obtaining inspection data comprising a plurality of sets of measurement data associated with a structure on a substrate or portion thereof;
obtaining fingerprint data describing a spatial variation of a parameter of interest over the substrate or portion thereof;
performing, by a hardware computer system, an iterative mapping of the inspection data to the fingerprint data; and
determining whether the substrate is subject to a process effect based on a degree to which the iterative mapping converges on a solution.