US 12,124,168 B2
Method and apparatus for coating photoresist over a substrate
Jing Chang, Taoyuan (TW); Ching-Hai Yang, Taipei (TW); and Wei-Hsiang Tseng, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Dec. 21, 2021, as Appl. No. 17/557,146.
Claims priority of provisional application 63/189,024, filed on May 14, 2021.
Prior Publication US 2022/0365435 A1, Nov. 17, 2022
Int. Cl. G03F 7/16 (2006.01); G05B 13/02 (2006.01); G06T 7/00 (2017.01); G06T 7/60 (2017.01); H01L 21/027 (2006.01); H01L 21/66 (2006.01); H04N 23/90 (2023.01)
CPC G03F 7/16 (2013.01) [G05B 13/027 (2013.01); G06T 7/001 (2013.01); G06T 7/60 (2013.01); H01L 21/0273 (2013.01); H01L 22/20 (2013.01); H04N 23/90 (2023.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for manufacturing a semiconductor device, comprising:
obtaining a first image of a fluid dispense nozzle using a first camera, the fluid dispense nozzle configured to dispense fluid on a semiconductor substrate;
obtaining a second image of the fluid dispense nozzle using a second camera, the second image having a higher resolution than the first image;
determining a width of the fluid dispense nozzle at multiple intervals along the fluid dispense nozzle and a width of a spray pattern of a fluid being dispensed from the fluid dispense nozzle at multiple intervals along the spray pattern;
fitting a first straight line to a series of data points representing a plurality of widths of the intervals along the fluid dispense nozzle and a plurality of widths of the intervals along the spray pattern;
determining a first slope of the first straight line; and
determining a condition of the spray pattern and the fluid dispense nozzle based on the first slope.