US 12,123,090 B2
Differential capacitive sensor for in-situ film thickness and dielectric constant measurement
Patrick Tae, Sunnyvale, CA (US); Yaoling Pan, San Diego, CA (US); and Leonard M Tedeschi, San Jose, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Sep. 14, 2023, as Appl. No. 18/368,285.
Application 18/368,285 is a division of application No. 16/526,268, filed on Jul. 30, 2019, granted, now 11,781,214.
Prior Publication US 2024/0002999 A1, Jan. 4, 2024
Int. Cl. C23C 14/52 (2006.01); C23C 14/54 (2006.01); C23C 16/52 (2006.01); G01N 27/22 (2006.01); H01J 37/32 (2006.01)
CPC C23C 14/52 (2013.01) [C23C 14/545 (2013.01); C23C 16/52 (2013.01); G01N 27/22 (2013.01); H01J 37/32935 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A processing chamber, comprising:
an inner volume defined in the processing chamber; and
a sensor assembly coupled to a surface located in the inner volume of the processing chamber and comprising an electrode configuration comprising a plurality of electrodes configured for time multiplexing, such that the plurality of electrodes provides a first input corresponding to a first time and a first response function, and a second input corresponding to a second time and a second response function different from the first response function.