CPC H05G 2/008 (2013.01) [G01V 8/12 (2013.01); H05G 2/005 (2013.01)] | 20 Claims |
1. A method, comprising:
irradiating a first target droplet in an extreme ultraviolet (EUV) light source apparatus of an EUV lithography tool with a laser beam to generate a plasma and a shock wave generated by the plasma;
illuminating the shock wave with an illumination light, which is a collimated light obtained from a source laser beam;
detecting the shock wave generated by the plasma of the first target droplet using a shock wave detection module;
determining an intensity of light detected at the shock wave detection module; and
when the intensity of light detected at the shock wave detection module is less than a first threshold amount or greater than a second threshold amount adjusting an amount of illumination light.
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