CPC H01L 21/02057 (2013.01) [G03F 1/80 (2013.01); H01L 21/31133 (2013.01); H01L 21/6708 (2013.01)] | 20 Claims |
1. An apparatus comprising:
a pump configured to circulate a solution;
a nozzle configured to dispense the solution;
a nozzle bath configured to accommodate a tip end of the nozzle and to receive the solution after the dispensing, the nozzle bath comprising a purge gas inlet and an overflow path;
a drain configured to accept overflow solution; and
a buffer tank configured to receive the solution from the nozzle bath and to circulate the solution back to the pump,
wherein the overflow path directs the overflow solution out of the nozzle bath to the drain via an overflow outlet for preventing an overflow condition, and
wherein the purge gas inlet is disposed on one side of the nozzle bath, the overflow path is disposed on an opposite side of the nozzle bath relative to the purge gas inlet, and the overflow path is configured to connect to the nozzle bath only via the overflow outlet.
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