CPC G03F 7/38 (2013.01) | 12 Claims |
1. A resist pattern formation method comprising:
forming a resist layer on a substrate, the resist layer containing a base resin, a sensitizer precursor, an acid generator, and a base;
allowing a portion of an acid to be neutralized with the base through pattern exposure on the resist layer, the acid being generated from the acid generator by the pattern exposure;
generating, after the pattern exposure, a sensitizer from the sensitizer precursor by performing heating of the resist layer in presence of the acid generated by the pattern exposure in the resist layer;
generating, after the heating of the resist layer, an acid from the acid generator by performing flood exposure on the resist layer in which the sensitizer has been generated;
performing heat treatment on the resist layer after the flood exposure; and
developing the resist layer after the heat treatment, wherein
in the heating of the resist layer, the resist layer is heated such that a size of a region of the resist layer in which the sensitizer is to be generated after the heating of the resist layer is equal to or smaller than a size of a region of the resist layer in which the acid has been generated by the pattern exposure.
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