	US 11,795,302 B2
	Resin particles and method for manufacturing resin particles
Koji Sasaki, Kanagawa (JP); Takahiro Mizuguchi, Kanagawa (JP); Yuka Zenitani, Kanagawa (JP); Sakae Takeuchi, Kanagawa (JP); and Yoshifumi Eri, Kanagawa (JP)
Assigned to FUJIFILM Business Innovation Corp., Tokyo (JP)
Filed by FUJIFILM BUSINESS INNOVATION CORP., Tokyo (JP)
Filed on Jan. 25, 2021, as Appl. No. 17/157,208.
Claims priority of application No. 2020-121632 (JP), filed on Jul. 15, 2020.
Prior Publication US 2022/0017723 A1, Jan. 20, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C08K 9/02 (2006.01); C08K 9/06 (2006.01); C08K 3/36 (2006.01); C08K 5/5445 (2006.01); C08K 5/19 (2006.01); C08G 63/20 (2006.01); C08K 3/08 (2006.01)

CPC C08K 9/02 (2013.01) [C08G 63/20 (2013.01); C08K 3/08 (2013.01); C08K 3/36 (2013.01); C08K 5/19 (2013.01); C08K 5/5445 (2021.01); C08K 9/06 (2013.01); C08K 2003/0812 (2013.01)]

19 Claims

1. Resin particles comprising:

resin base particles; and

silica particles on surfaces of the resin base particles, the silica particles containing a quaternary ammonium salt and having hydrophobized surfaces,

wherein a difference (detection temperature A−detection temperature B) between a detection temperature A and a detection temperature B is more than 50° C., where the detection temperature A is a detection temperature from a pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles before cleaning, and the detection temperature B is a detection temperature from the pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles after cleaning.