US 12,453,140 B2
Superjunction semiconductor device and method of manufacturing same
Won Kook Cho, Bucheon-si (KR); and Myeong Bum Pyun, Incheon (KR)
Assigned to DB HiTek Co., Ltd., Bucheon-si (KR)
Filed by DB HITek Co., Ltd., Bucheon-si (KR)
Filed on Dec. 28, 2022, as Appl. No. 18/147,698.
Claims priority of application No. 10-2022-0007668 (KR), filed on Jan. 19, 2022.
Prior Publication US 2023/0231010 A1, Jul. 20, 2023
Int. Cl. H10D 62/10 (2025.01); H10D 30/66 (2025.01)
CPC H10D 62/111 (2025.01) [H10D 30/665 (2025.01); H10D 62/105 (2025.01); H10D 62/107 (2025.01)] 13 Claims
OG exemplary drawing
 
1. A superjunction semiconductor device comprising:
a substrate;
an epitaxial layer on the substrate;
pillars in the epitaxial layer, the pillars comprising a plurality of first pillars in a cell region, a plurality of second pillars in a ring region, and a plurality of third pillars in a transition region;
a first body region in the epitaxial layer and electrically connected to a corresponding one of the first pillars;
a source in the first body region;
a gate on the epitaxial layer;
an interlayer insulating layer on the epitaxial layer and covering the gate;
a first contact in the cell region and passing through the interlayer insulating layer;
a second contact in the transition region and passing through the interlayer insulating layer; and
a connector connecting adjacent pillars,
wherein the connector has a first width less than half of a second width of each of the second pillars and/or the third pillars.