| CPC H01L 21/67034 (2013.01) [H01L 21/67051 (2013.01); H01L 21/6719 (2013.01)] | 12 Claims |
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1. A substrate treating apparatus comprising:
a chamber providing a treatment space therein;
a substrate support member located inside the chamber and for supporting a substrate;
an upper supply port provided on a top wall of the chamber and supplying a treatment fluid into the treatment space of the chamber;
a lower supply port provided on a bottom wall of the chamber and supplying a treatment fluid into the treatment space; and
a filler member located between the lower supply port and the substrate supported by the substrate support member,
the filler member including a plate with a plurality of perforations and a plurality of support rods located below the plate,
wherein, when viewed from above, the plurality of the support rods surround the lower supply port, and support the plate,
a portion of the treatment fluid supplied through the lower supply port is-being supplied to the substrate through the plurality of perforations formed in the plate, and another portion of the treatment fluid is supplied to the substrate through a space formed between adjacent rods of the plurality of the support rods,
the plurality of perforations being in a collision shape such that streams of the treatment fluid passing through the plurality of perforations collide with each other.
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