US 12,451,338 B2
Plasma treatment apparatus member
Daiki Watanabe, Satsumasendai (JP); Miki Hamada, Satsumasendai (JP); and Yuusaku Ishimine, Satsumasendai (JP)
Assigned to KYOCERA Corporation, Kyoto (JP)
Appl. No. 18/570,565
Filed by KYOCERA Corporation, Kyoto (JP)
PCT Filed Jun. 9, 2022, PCT No. PCT/JP2022/023350
§ 371(c)(1), (2) Date Dec. 14, 2023,
PCT Pub. No. WO2022/264922, PCT Pub. Date Dec. 22, 2022.
Claims priority of application No. 2021-099573 (JP), filed on Jun. 15, 2021.
Prior Publication US 2024/0290582 A1, Aug. 29, 2024
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32724 (2013.01) [H01J 37/32449 (2013.01); H01J 37/32568 (2013.01); H01J 37/32651 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A plasma treatment apparatus member comprising:
a base made of a ceramic and comprising a facing surface facing an object to be processed;
a plasma electrode located inside the base;
a heating element located farther from the facing surface than the plasma electrode is, inside the base; and
a conductive layer located farther from the facing surface than the plasma electrode is, inside the base, wherein
the heating element and the conductive layer do not overlap each other in plan view seen from a direction orthogonal to the facing surface, and are located at different heights in side view seen from a direction parallel to the facing surface.