US 12,451,330 B2
Method of controlling high-frequency power supply system
Yuichi Hasegawa, Osaka (JP); and Yuya Ueno, Osaka (JP)
Assigned to DAIHEN Corporation, Osaka (JP)
Filed by DAIHEN Corporation, Osaka (JP)
Filed on Dec. 27, 2023, as Appl. No. 18/396,696.
Claims priority of application No. 2022-212632 (JP), filed on Dec. 28, 2022.
Prior Publication US 2024/0222083 A1, Jul. 4, 2024
Int. Cl. H01J 37/32 (2006.01); H03H 7/38 (2006.01)
CPC H01J 37/32183 (2013.01) [H01J 37/32146 (2013.01); H01J 37/32155 (2013.01); H03H 7/38 (2013.01)] 2 Claims
OG exemplary drawing
 
1. A method of controlling a high-frequency power supply system, the high-frequency power supply system including:
a second power supply capable of outputting a second forward wave voltage having a second fundamental frequency lower than a first fundamental frequency, the second power supply performing pulse modulation of repeating an ON operation of outputting the second forward wave voltage and an OFF operation of not outputting the second forward wave voltage;
a first power supply capable of outputting a first forward wave voltage having the first fundamental frequency, the first power supply performing frequency modulation control of frequency-modulating the first forward wave voltage with a modulation signal having a frequency substantially identical with the second fundamental frequency in a second power supply ON period in which the ON operation is performed, the first power supply performing frequency offset control of outputting a third forward wave voltage having a third fundamental frequency obtained by adding an offset frequency to the first fundamental frequency in a second power supply OFF period in which the OFF operation is performed;
a first matcher connected between the first power supply and a load, the first matcher performing a first matching operation of matching an impedance of the first power supply to an impedance of the load; and
a second matcher connected between the second power supply and the load, the second matcher performing a second matching operation of matching an impedance of the second power supply to the impedance of the load,
the method comprising:
by the first matcher, performing the first matching operation after power supply from the first power supply and the second power supply to the load is started, and stopping the first matching operation when the first matching operation is completed;
searching for an initial phase of the modulation signal at which an absolute value of a reflection coefficient or a power value of a reflected wave power at an output terminal of the first power supply calculated in the second power supply ON period is minimized within a search range in a state where the first matching operation in the first matching unit is stopped;
by the first matcher, performing the first matching operation after searching for the initial phase of the modulation signal, and stopping the first matching operation when the first matching operation is completed;
searching for a frequency shift at which the absolute value of the reflection coefficient or the power value of the reflected wave power at the output terminal of the first power supply calculated in the second power supply ON period is minimized within a search range in a state where the first matching operation in the first matching unit is stopped;
by the first matcher, performing the matching operation after searching for the frequency shift, and stopping the matching operation when the matching operation is completed; and
searching for an offset frequency at which the absolute value of the reflection coefficient or the power value of the reflected wave power at the output terminal of the first power supply calculated in the second power supply OFF period is minimized within a search range in a state where the first matching operation in the first matching unit is stopped.