| CPC H01J 37/3211 (2013.01) [H01J 2237/334 (2013.01)] | 9 Claims |
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1. A plasma source using a planar helical coil, provided above a chamber and forming plasma, the plasma source comprising:
a unit coil extending from one unit-extension end, and extending, within one plane, in a circular shape to another unit-extension end,
the unit coil being stacked a plurality of times; and
a connector connecting the other unit-extension end of one unit coil to the unit-extension end of another unit coil,
an internal coil having a smaller diameter than a diameter or width of a wafer accommodated on a base plate inside the chamber,
wherein the connector has a length of about 5 mm to about 15 mm,
wherein a separation distance is provided between the unit-extension end and the other unit-extension end of the unit coil,
wherein the internal coil includes a plurality of internal unit coils having a circular shape, and the plurality of internal unit coils are provided on a same plane,
wherein the internal unit coil extends in a circular shape from an internal unit-extension end to another internal unit-extension end, and
the plasma source further includes an internal connector configured to connect the other internal unit-extension end of one internal unit coil to the internal unit-extension end of another internal unit coil,
wherein an internal separation distance is provided between the internal unit-extension end and the other internal unit-extension end of the internal unit coil.
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