US 12,451,316 B2
Extreme-ultraviolet light source device using electron beams
Kyu Chang Park, Seoul (KR)
Assigned to WORLDBEAM SOLUTION CO., LTD., Seoul (KR)
Appl. No. 17/905,909
Filed by WORLDBEAM SOLUTION CO., LTD., Seoul (KR)
PCT Filed Mar. 11, 2021, PCT No. PCT/KR2021/003021
§ 371(c)(1), (2) Date Sep. 8, 2022,
PCT Pub. No. WO2021/182887, PCT Pub. Date Sep. 16, 2021.
Claims priority of application No. 10-2020-0031395 (KR), filed on Mar. 13, 2020.
Prior Publication US 2023/0122253 A1, Apr. 20, 2023
Int. Cl. H01J 31/04 (2006.01); H01J 29/04 (2006.01); H01J 29/58 (2006.01); H05G 2/00 (2006.01)
CPC H01J 31/04 (2013.01) [H01J 29/04 (2013.01); H01J 29/58 (2013.01); H05G 2/002 (2024.08); H05G 2/008 (2013.01); H01J 2229/481 (2013.01); H01J 2229/507 (2013.01)] 10 Claims
OG exemplary drawing
 
1. An extreme-ultraviolet light source device, comprising:
a discharge chamber of which the inside is maintained in a vacuum;
an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and
a metal radiator which is located inside the discharge chamber and is ionized by the electron beams,
wherein extreme-ultraviolet radiation occurs in plasma generated from the metal radiator, and
the electron beam-emitting unit includes a cathode electrode, a plurality of emitters located on the cathode electrode and including a carbon-based material, and a gate electrode which is located on the plurality of emitters at a distance from the plurality of emitters and to which a pulse voltage is applied.