US 12,449,825 B2
Gas supply control device
Yoshifumi Ogawa, Tokyo (JP); and Yutaka Kouzuma, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Appl. No. 17/642,324
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed Mar. 29, 2021, PCT No. PCT/JP2021/013349
§ 371(c)(1), (2) Date Mar. 11, 2022,
PCT Pub. No. WO2022/208621, PCT Pub. Date Oct. 6, 2022.
Prior Publication US 2024/0111313 A1, Apr. 4, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G05D 7/06 (2006.01); F16K 31/06 (2006.01); F16K 37/00 (2006.01); H01L 21/67 (2006.01)
CPC G05D 7/0652 (2013.01) [F16K 31/0603 (2013.01); F16K 37/005 (2013.01); H01L 21/67017 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A gas supply control device that supplies a gas to a processing chamber in which a workpiece is processed, comprising:
a first port (A) that is connected to a gas source of a purge gas;
a second port (C) to which a first gas source of a first processing gas is connected;
a third port (D) to which a second gas source of a second processing gas is connected;
a collective pipe that is connected to the processing chamber, and in which each of the purge gas and the first and second processing gases supplied from the first port, the second port, and the third port merges, respectively, and flows;
a first flow rate controller (FCA) that is connected between the first port and the collective pipe;
a second flow rate controller (FCC) that is connected between the second port and the collective pipe; and
a third flow rate controller (FCD) that is connected between the third port and the collective pipe,
wherein a gas flow path through which the purge gas flows is provided from an output side of the first flow rate controller and is connected to only an input side of the second flow rate controller, an input side of the third flow rate controller, and the collective pipe. (FIG. 1, item 100 [0059].