US 12,449,736 B2
Measurement apparatus and measurement method
Kentaro Kasa, Kariya Aichi (JP); Soichi Inoue, Yokkaichi Mie (JP); Satoshi Tanaka, Yokohama Kanagawa (JP); and Hiroyuki Tanizaki, Nagoya Aichi (JP)
Assigned to Kioxia Corporation, Tokyo (JP)
Filed by Kioxia Corporation, Tokyo (JP)
Filed on Sep. 9, 2022, as Appl. No. 17/941,232.
Claims priority of application No. 2022-018591 (JP), filed on Feb. 9, 2022.
Prior Publication US 2023/0251582 A1, Aug. 10, 2023
Int. Cl. G03F 7/00 (2006.01); G01B 11/14 (2006.01)
CPC G03F 7/70616 (2013.01) [G01B 11/14 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A measurement apparatus configured to measure a relative positional displacement amount of a partial pattern to another pattern in a complex pattern on a surface of an object,
the apparatus comprising:
a measurement part configured to measure a plurality of two-dimensional intensity distributions having a first two-dimensional intensity distribution and a second two-dimensional intensity distribution, the first two-dimensional intensity distribution being formed by applying a first illumination light having a first illumination shape to a region on which the complex pattern is measured and detecting only zero order diffraction light from the region via a first filter, and the second two-dimensional intensity distribution being formed by applying second illumination light having a second illumination shape to the region and detecting only zero order diffraction light from the region via a second filter;
a storage part configured to store a plurality of measurement data indicating the plurality of two-dimensional intensity distributions; and
a calculation part configured to execute calculating processing using the plurality of measurement data to form a synthesized intensity distribution obtained by the plurality of two-dimensional intensity distributions, and calculate a positional displacement amount of the partial pattern based on the synthesized intensity distribution.