| CPC G03F 7/162 (2013.01) | 20 Claims |
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1. A substrate treating apparatus, comprising:
a chamber comprising a gate through which a substrate is loaded into the chamber and unloaded from the chamber;
a gas supply unit in an upper portion of the chamber and configured to supply gas into the chamber;
a spin coater in a lower portion of the chamber, the spin coater comprising a spin chuck configured to support and rotate the substrate on an upper surface thereof, and a cup portion extending around the substrate and configured to collect and discharge a chemical liquid from the substrate;
a chemical liquid supply unit configured to supply the chemical liquid onto the substrate; and
a heater between the substrate and the gas supply unit and configured to heat the substrate.
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