	US 12,449,729 B2
	Resist composition and method of forming resist pattern
Koshi Onishi, Kawasaki (JP); Masatoshi Arai, Kawasaki (JP); Masahito Yahagi, Kawasaki (JP); Yosuke Suzuki, Kawasaki (JP); and Yuta Iwasawa, Kawasaki (JP)
Assigned to TOKYO OHKA KOGYO CO., LTD., Kawasaki (JP)
Filed by TOKYO OHKA KOGYO CO., LTD., Kawasaki (JP)
Filed on Oct. 11, 2021, as Appl. No. 17/450,528.
Claims priority of application No. 2020-175440 (JP), filed on Oct. 19, 2020; application No. 2021-143257 (JP), filed on Sep. 2, 2021; and application No. 2021-161666 (JP), filed on Sep. 30, 2021.
Prior Publication US 2022/0121116 A1, Apr. 21, 2022
Int. Cl. G03F 7/004 (2006.01); C08F 212/14 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01)

CPC G03F 7/0045 (2013.01) [C08F 212/24 (2020.02); G03F 7/038 (2013.01); G03F 7/039 (2013.01)]

4 Claims

1. A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:

a resin component (A1) which exhibits changed solubility in a developing solution under action of acid; and

an acid generator component (B) which generates an acid upon exposure,

wherein the resin component (A1) contains one or more compounds selected from the group consisting of a polymeric compound represented by chemical formula (A1-2), a polymeric compound represented by chemical formula (A1-4), a polymeric compound represented by chemical formula (A1-x1) and a polymeric compound represented by chemical formula (A1-x2), and

the acid generator component (B) contains one or more compounds selected from the group consisting of a compound represented by Chemical Formula (B01-6), a compound represented by Chemical Formula (B01-9), a compound represented by Chemical Formula (B01-x1), a compound represented by Chemical Formula (B01-x2), a compound represented by Chemical Formula (B01-x3), a compound represented by Chemical Formula (B01-x4), a compound represented by Chemical Formula (B01-x5), a compound represented by Chemical Formula (B01-x6), a compound represented by Chemical Formula (B01-x7) and a compound represented by Chemical Formula (B01-x8):