US 12,449,726 B2
Apparatus for assembly of a reticle assembly
Ilya Malakhovsky, Eindhoven (NL); Derk Servatius Gertruda Brouns, Herentals (BE); Joffrey Rene Sylvian Craquelin, Eindhoven (NL); Edward Hage, Budel (NL); Pieter Renaat Maria Hennus, Peer (BE); Jan Willem Adriaan Oosterling, Nederweert (NL); Ludolf Postma, Nijmegen (NL); Marcel Duco Snel, Eindhoven (NL); Johannes Charles Adrianus Van Den Berg, Prinsenbeek (NL); Wouter Van Der Chijs, Eindhoven (NL); Bartel Joris Van Der Veek, Eindhoven (NL); Mike Johannes Antonius Van Kuijk, Vlijmen (NL); Marina Antoinetta Leonarda Van Uum-Van Herk, Stramproy (NL); and Henricus Marinus Theodorus Wiersma, Neerpelt (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/433,038
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Feb. 25, 2020, PCT No. PCT/EP2020/054807
§ 371(c)(1), (2) Date Aug. 23, 2021,
PCT Pub. No. WO2020/173892, PCT Pub. Date Sep. 3, 2020.
Claims priority of application No. 19159943 (EP), filed on Feb. 28, 2019; application No. 19163828 (EP), filed on Mar. 19, 2019; and application No. 19191214 (EP), filed on Aug. 12, 2019.
Prior Publication US 2022/0155675 A1, May 19, 2022
Int. Cl. G03F 1/64 (2012.01); G03F 1/24 (2012.01); G03F 7/00 (2006.01)
CPC G03F 1/64 (2013.01) [G03F 1/24 (2013.01); G03F 7/70983 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A pellicle frame attachment apparatus comprising:
a pellicle assembly handling apparatus configured to handle a pellicle assembly and comprising support arms configured to grip and hold the pellicle assembly;
a patterning device handling apparatus configured to handle a patterning device and comprising support arms configured to grip and hold the patterning device; and
a rail,
wherein the pellicle assembly handling apparatus is supported by and is movable in a direction relative to the rail, wherein the patterning device handling apparatus is supported by and is movable in the same direction relative to the rail, and wherein the relative movement between the pellicle assembly handling apparatus and the patterning device handling apparatus changes a proportion of overlap between the patterning device and the pellicle assembly.