US 12,449,309 B2
Methods for detection using optical emission spectroscopy
Zuoming Zhu, Sunnyvale, CA (US); Martin A. Hilkene, Gilroy, CA (US); Avinash Shervegar, Karnataka (IN); Surendra Singh Srivastava, Santa Clara, CA (US); Ala Moradian, Sunnyvale, CA (US); Shu-Kwan Lau, Sunnyvale, CA (US); Zhiyuan Ye, San Jose, CA (US); Enle Choo, Saratoga, CA (US); Flora Fong-Song Chang, Saratoga, CA (US); Bindusagar Marath Sankarathodi, San Jose, CA (US); Patricia M. Liu, Saratoga, CA (US); Errol Antonio C. Sanchez, Tracy, CA (US); Jenny Lin, Saratoga, CA (US); Nyi O. Myo, San Jose, CA (US); and Schubert S. Chu, San Francisco, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Appl. No. 17/630,235
Filed by Applied Materials, Inc., Santa Clara, CA (US)
PCT Filed Jul. 8, 2020, PCT No. PCT/US2020/041172
§ 371(c)(1), (2) Date Jan. 26, 2022,
PCT Pub. No. WO2021/025819, PCT Pub. Date Feb. 11, 2021.
Claims priority of application No. 201941031810 (IN), filed on Aug. 6, 2019.
Prior Publication US 2022/0283029 A1, Sep. 8, 2022
Int. Cl. C23C 16/455 (2006.01); G01J 3/443 (2006.01)
CPC G01J 3/443 (2013.01) [C23C 16/45502 (2013.01); C23C 16/45527 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for adjusting process variables within a process chamber, comprising:
flowing one or more precursors into the process chamber;
performing a deposition process within the process chamber;
monitoring an elemental composition of the one or more precursors by identifying emission peaks of emitted photons through a foreline with an optical emission spectrometer;
sending input signals associated with the emission peaks from the optical emission spectrometer to a controller;
comparing, by the controller, the input signals to stored values; and
adjusting process variables of the deposition process within the process chamber based on the comparison.