| CPC C30B 29/04 (2013.01) [C30B 25/08 (2013.01); C30B 25/12 (2013.01); C30B 25/16 (2013.01); C30B 25/20 (2013.01)] | 8 Claims |

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1. An MPCVD device, comprising a deposition platform, a substrate platform, a microwave quartz window, an upper cover plate, and a baseplate, wherein a reaction cavity is formed by the upper cover plate and the baseplate, an inlet hole is arranged on a top of the upper cover plate, and an exhaust hole that is connected with a vacuumizing device is arranged on the baseplate, so as to vacuumize the reaction cavity to form a vacuum environment; the microwave quartz window is annular shaped and arranged between the deposition platform and the baseplate, and the reaction cavity is isolated from air outside by the microwave quartz window; and a connection between the baseplate and the upper cover plate is sealed by an O-shaped sealing ring assembly, and the O-shaped sealing ring assembly is arranged in a sealing groove on the baseplate, wherein the O-shaped sealing ring assembly comprises a vacuum sealing ring and a microwave shielding sealing ring that are arranged in a manner of concentric circle; and further comprises a pressure sensor arranged in the reaction cavity for measuring a gas pressure in the reaction cavity, and a plurality of composite windows arranged on the upper cover plate and hermetically connected to the upper cover plate, wherein a thickness measuring device, a visual device, a temperature measuring device and a plasma diagnostic device are provided at each of the composite windows, wherein the thickness measuring device is configured to measure a growth thickness of a diamond in real time, the visual device is configured to detect surface defects and estimate a temperature difference in real time, the temperature measuring device is configured to detect a diamond temperature in real time, and the plasma diagnostic device is configured to measure contents of various carbon-containing groups on a growth surface of the diamond;
wherein the MPCVD device further comprises a lifting platform for driving the substrate platform to raise or lower; the lifting platform is provided with a vacuum channel and a cooling channel therein; the substrate platform is installed on an upper surface of the lifting platform; a vacuum cavity is formed between a lower surface of the substrate platform and the upper surface of the lifting platform, wherein the vacuum cavity is communicated with the vacuum channel; and a pressure sensor for monitoring a gas pressure is arranged in the vacuum cavity.
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