| CPC C23C 16/45527 (2013.01) [C23C 16/06 (2013.01); C23C 16/45553 (2013.01)] | 21 Claims |

|
1. A method comprising:
providing a substrate having a plurality of features spaced apart, each feature having a feature opening width, wherein the width of the feature narrows from the top of the feature to the bottom of the feature;
depositing a first conformal metal nucleation layer in the plurality of features; and
depositing a second conformal metal nucleation layer on the first conformal metal nucleation layer, wherein one or more of the following is different during deposition of the first conformal metal nucleation layer than during deposition of the second conformal metal nucleation layer: a) reducing agent chemistry, b) metal precursor and reducing agent flow sequence, c) metal precursor and reducing agent flow duration, d) purge conditions, e) chamber pressure, and f) substrate temperature.
|