US 12,448,681 B2
Methods of forming molybdenum-containing films deposited on elemental metal films
Guo Liu, Haverhill, MA (US); Jacob Woodruff, Lexington, MA (US); and Jean-Sébastien Lehn, Somerville, NJ (US)
Assigned to MERCK PATENT GMBH, Darmstadt (DE)
Appl. No. 17/926,818
Filed by MERCK PATENT GMBH, Darmstadt (DE)
PCT Filed May 21, 2021, PCT No. PCT/EP2021/063590
§ 371(c)(1), (2) Date Nov. 21, 2022,
PCT Pub. No. WO2021/239596, PCT Pub. Date Dec. 2, 2021.
Claims priority of provisional application 63/030,077, filed on May 26, 2020.
Prior Publication US 2023/0203645 A1, Jun. 29, 2023
Int. Cl. C23C 16/08 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01)
CPC C23C 16/08 (2013.01) [C23C 16/45534 (2013.01); C23C 16/45553 (2013.01); C23C 16/52 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A method for forming a molybdenum-containing film, the method comprising:
A. thermally depositing a first film comprising an elemental metal on a surface of a substrate at a first temperature less than or equal to about 400° C., wherein the elemental metal is cobalt; and
B. thermally depositing a second film on at least a portion of the first film at a second temperature of greater than about 400° C., wherein the second film comprises a reaction product of a molybdenum-containing precursor with a reducing agent.