	US 12,448,568 B2
	Etching compositions
Dmitry Dinega, Mesa, AZ (US); and Thomas Dory, Gilbert, AZ (US)
Assigned to Fujifilm Electronic Materials U.S.A., Inc., N. Kingstown, RI (US)
Filed by Fujifilm Electronic Materials U.S.A., Inc., N. Kingstown, RI (US)
Filed on Feb. 14, 2023, as Appl. No. 18/109,298.
Claims priority of provisional application 63/318,498, filed on Mar. 10, 2022.
Prior Publication US 2023/0313041 A1, Oct. 5, 2023
Int. Cl. C09K 13/06 (2006.01); H01L 21/306 (2006.01)

CPC C09K 13/06 (2013.01) [H01L 21/30604 (2013.01)]

15 Claims

1. An etching composition, consisting of:

at least one quaternary ammonium hydroxide or a salt thereof;

at least one oxidizing agent;

at least one polyamine; and

water;

wherein the composition has a pH of at least about 13.