US 12,448,541 B2
Polishing liquid and chemical mechanical polishing method
Tetsuya Kamimura, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Dec. 5, 2021, as Appl. No. 17/542,486.
Application 17/542,486 is a continuation of application No. PCT/JP2020/018765, filed on May 11, 2020.
Claims priority of application No. 2019-114674 (JP), filed on Jun. 20, 2019.
Prior Publication US 2022/0089909 A1, Mar. 24, 2022
Int. Cl. C09G 1/02 (2006.01); H01L 21/321 (2006.01)
CPC C09G 1/02 (2013.01) [H01L 21/3212 (2013.01)] 21 Claims
OG exemplary drawing
 
1. A polishing liquid used for chemical mechanical polishing of an object to be polished having a cobalt-containing film, the polishing liquid comprising:
colloidal silica;
an organic acid;
a nitrogen-containing aromatic heterocyclic compound which is one or more selected from the group consisting of a compound represented by General Formula (I), a compound represented by General Formula (II), a compound represented by General Formula (III), a compound represented by General Formula (IV), and a compound represented by General Formula (V), and has a ClogP value of less than 1.0; and
hydrogen peroxide,
wherein a pH is 8.5 to 12.0,

OG Complex Work Unit Chemistry
in General Formula (I), R11 and R12 each independently represent a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group, and R11 and R12 may be bonded to each other to form a ring,

OG Complex Work Unit Chemistry
in General Formula (II), a ring A2 represents a benzene ring or a 6-membered aromatic heterocycle, R21 represents a hydrophilic group or a hydrocarbon group having a hydrophilic group, and R22 represents a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group,

OG Complex Work Unit Chemistry
in General Formula (III), a ring A3 represents a benzene ring or a 6-membered aromatic heterocycle, R31 represents a hydrophilic group or a hydrocarbon group having a hydrophilic group, and R32 represents a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group,

OG Complex Work Unit Chemistry
in General Formula (IV), R41 represents a substituent, R42 represents a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group, and R41 and R42 may be bonded to each other to form a ring,

OG Complex Work Unit Chemistry
in General Formula (V), R51, R52, and R53 each independently represent a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group, and R51 and R52 may be bonded to each other to form a ring, and R51 and R53 may be bonded to each other to form a ring,
the polishing liquid further comprises sodium and potassium,
wherein a mass ratio of a content of potassium to a content of sodium is 1.0×106 to 1.0×1012.
 
20. A polishing liquid used for chemical mechanical polishing of an object to be polished, the polishing liquid comprising:
abrasive grains;
an organic acid;
a nitrogen-containing aromatic heterocyclic compound which is one or more selected from the group consisting of a compound represented by General Formula (I), a compound represented by General Formula (II), a compound represented by General Formula (III), a compound represented by General Formula (IV), and a compound represented by General Formula (V), and has a ClogP value of less than 1.0; and
hydrogen peroxide,
wherein a pH is 8.5 to 12.0,

OG Complex Work Unit Chemistry
in General Formula (I), R11 and R12 each independently represent a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group, and R11 and R12 may be bonded to each other to form a ring,

OG Complex Work Unit Chemistry
in General Formula (II), a ring A2 represents a benzene ring or a 6-membered aromatic heterocycle, R21 represents a hydrophilic group or a hydrocarbon group having a hydrophilic group, and R22 represents a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group,

OG Complex Work Unit Chemistry
in General Formula (III), a ring A3 represents a benzene ring or a 6-membered aromatic heterocycle, R31 represents a hydrophilic group or a hydrocarbon group having a hydrophilic group, and R32 represents a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group,

OG Complex Work Unit Chemistry
in General Formula (IV), R41 represents a substituent, R42 represents a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group, and R41 and R42 may be bonded to each other to form a ring,

OG Complex Work Unit Chemistry
in General Formula (V), R51, R52, and R53 each independently represent a hydrogen atom, a hydrophilic group, or a hydrocarbon group having a hydrophilic group, and R51 and R52 may be bonded to each other to form a ring, and R51 and R53 may be bonded to each other to form a ring,
the polishing liquid further comprises sodium and potassium,
wherein a mass ratio of a content of potassium to a content of sodium is 1.0×106 to 1.0×1012.