	US 12,447,739 B2
	Droplet analysis unit and substrate treatment apparatus including the same
Won Yong Jin, Cheonan-si (KR); Jae Duck Lee, Cheonan-si (KR); and Suk Won Jang, Cheonan-si (KR)
Assigned to Semes Co., Ltd., Cheonan-si (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Jul. 5, 2023, as Appl. No. 18/346,984.
Claims priority of application No. 10-2022-0093076 (KR), filed on Jul. 27, 2022.
Prior Publication US 2024/0034056 A1, Feb. 1, 2024
Int. Cl. B41J 2/045 (2006.01); B41J 25/00 (2006.01); G02B 27/00 (2006.01); H04N 23/63 (2023.01)

CPC B41J 2/04561 (2013.01) [B41J 2/04558 (2013.01); B41J 25/001 (2013.01); G02B 27/0025 (2013.01); H04N 23/631 (2023.01)]

18 Claims

1. A substrate treatment apparatus comprising:

a process treatment unit supporting a substrate while the substrate is being treated;

an inkjet head unit treating the substrate by ejecting a substrate treatment liquid onto the substrate using a plurality of nozzles;

a gantry unit moving the inkjet head unit over the substrate; and

a droplet analysis unit measuring a meniscus in each of the nozzles that is associated with the substrate treatment liquid,

wherein the droplet analysis unit measures and quantifies three-dimensional (3D) information regarding the meniscus based on chromatic aberration.