US 12,447,666 B2
Imprint apparatus and article manufacturing method
Naoki Maruyama, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Oct. 20, 2022, as Appl. No. 17/969,909.
Claims priority of application No. 2021-183520 (JP), filed on Nov. 10, 2021.
Prior Publication US 2023/0145758 A1, May 11, 2023
Int. Cl. G03F 7/00 (2006.01); B29C 59/00 (2006.01); B29C 59/02 (2006.01); B29C 37/00 (2006.01)
CPC B29C 59/002 (2013.01) [B29C 59/026 (2013.01); B29C 2037/903 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An imprint apparatus for forming a pattern to an imprint material on a substrate by using a mold, the imprint apparatus comprising:
a mold holding unit configured to hold the mold;
a mold driving unit configured to move the mold holding unit;
a substrate holding unit configured to hold the substrate;
a substrate driving unit configured to move the substrate holding unit; and
a controller programmed to control the mold driving unit and the substrate driving unit to perform:
a contacting step of moving at least one of the mold holding unit and the substrate holding unit by at least one of the mold driving unit and the substrate driving unit such that the mold and the imprint material on a substrate surface are brought into contact with each other;
an obtaining step of obtaining a driving force applied to the substrate holding unit in a first direction parallel to the substrate surface by the substrate driving unit to move the substrate holding unit after performing the contacting step; and
a tilt correcting step of reducing a relative tilt between the mold and the substrate by the mold driving unit based on the driving force obtained in the obtaining step and a predetermined parameter including at least one of a size of a shot region on the substrate surface on which the pattern of the imprint material is formed, and an order of the shot regions on the substrate surface on which the pattern of the imprint material is formed.