US 12,447,449 B2
Chemical supply apparatus, cleaning system, and chemical supply method
Fujihiko Toyomasu, Tokyo (JP); Junji Kunisawa, Tokyo (JP); and Kenichiro Saito, Tokyo (JP)
Assigned to EBARA CORPORATION, Tokyo (JP)
Filed by EBARA CORPORATION, Tokyo (JP)
Filed on Feb. 7, 2023, as Appl. No. 18/165,407.
Claims priority of application No. 2022-018685 (JP), filed on Feb. 9, 2022; and application No. 2022-196822 (JP), filed on Dec. 9, 2022.
Prior Publication US 2023/0249145 A1, Aug. 10, 2023
Int. Cl. B01F 35/22 (2022.01); B01F 35/221 (2022.01); B08B 3/02 (2006.01); B01F 101/24 (2022.01)
CPC B01F 35/2211 (2022.01) [B08B 3/02 (2013.01); B01F 2101/24 (2022.01)] 11 Claims
OG exemplary drawing
 
1. A chemical supply apparatus comprising:
a first cleaning chemical supply pipe;
a first mixer that mixes a first chemical and water to generate a first cleaning chemical; and
a first supply controller, wherein
the first cleaning chemical supply pipe includes
an upstream pipe forming a channel from the first mixer to a first junction,
a first pipe forming a channel from the first junction to a first nozzle, and
a second pipe forming a channel from the first junction to a second nozzle, and
the first supply controller is configured to execute a feedback control on the basis of the flow rate of the first cleaning chemical inside the first pipe of the first cleaning chemical supply pipe so that the flow rate of the first cleaning chemical flowing through the first pipe of the first cleaning chemical supply pipe is a set flow rate.