CPC H01L 27/1469 (2013.01) [H01L 27/14634 (2013.01); H01L 31/03046 (2013.01); H01L 31/1852 (2013.01)] | 28 Claims |
1. A method for forming a composite substrate containing layers of dissimilar materials, the method comprising:
forming a release layer over a base substrate having a buffer layer, the base substrate being composed of a first material;
attaching a metal template layer to the release layer, the metal template layer being composed of a Group III metal;
depositing a capping layer over the metal template layer, the capping layer being composed of a dielectric material;
patterning the metal template layer and the capping layer to form a first composite substrate including a first plurality of separated template units separated by a first plurality of trenches;
annealing the first composite substrate in an ambient gas to form a second composite substrate wherein metal template layer is converted to a first crystalline semiconductor layer which is interposed between the buffer layer and the capping layer; and
removing the capping layer to form a third composite substrate such that the first crystalline semiconductor layer is exposed.
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