US 12,119,353 B2
Semiconductor device, electronic component, and electronic device
Shunpei Yamazaki, Setagaya (JP); Kiyoshi Kato, Atsugi (JP); and Tomoaki Atsumi, Hadano (JP)
Assigned to Semiconductor Energy Laboratory Co., Ltd., Atsugi (JP)
Filed by Semiconductor Energy Laboratory Co., Ltd., Atsugi (JP)
Filed on Nov. 27, 2023, as Appl. No. 18/519,294.
Application 18/519,294 is a continuation of application No. 17/400,264, filed on Aug. 12, 2021, abandoned.
Application 17/400,264 is a continuation of application No. 16/616,707, granted, now 11,114,470, issued on Sep. 7, 2021, previously published as PCT/IB2018/053722, filed on May 25, 2018.
Claims priority of application No. 2017-110472 (JP), filed on Jun. 2, 2017; application No. 2017-123211 (JP), filed on Jun. 23, 2017; application No. 2017-221517 (JP), filed on Nov. 17, 2017; application No. 2018-027614 (JP), filed on Feb. 20, 2018; and application No. 2018-027730 (JP), filed on Feb. 20, 2018.
Prior Publication US 2024/0088162 A1, Mar. 14, 2024
Int. Cl. H01L 27/12 (2006.01); H01L 29/786 (2006.01); H10B 12/00 (2023.01)
CPC H01L 27/1225 (2013.01) [H01L 27/1255 (2013.01); H01L 29/7869 (2013.01); H10B 12/20 (2023.02)] 5 Claims
OG exemplary drawing
 
1. A semiconductor device comprising:
a cell array comprising a first memory cell and a second memory cell;
a first driver circuit configured to supply a selection signal; and
a second driver circuit configured to write or read out data,
wherein the first memory cell comprises a first transistor and a first capacitor,
wherein the second memory cell comprises a second transistor and a second capacitor,
wherein one of a source and a drain of the first transistor is electrically connected to the first capacitor,
wherein one of a source and a drain of the second transistor is electrically connected to the second capacitor,
wherein each of the first transistor and the second transistor includes a first oxide semiconductor layer and a second oxide semiconductor layer over the first oxide semiconductor layer,
wherein the first transistor includes at least a first channel formation region formed in the second oxide semiconductor layer, a third oxide semiconductor layer over the first channel formation region, a first gate electrode over the third oxide semiconductor layer, and a second gate electrode under the first channel formation region, and
wherein the second transistor includes at least a second channel formation region formed in the second oxide semiconductor layer, a fourth oxide semiconductor layer over the second channel formation region, a third gate electrode over the fourth oxide semiconductor layer, and a fourth gate electrode under the second channel formation region.