US 12,119,242 B2
Film processing method
Yuji Tanaka, Kyoto (JP); Masaya Asai, Kyoto (JP); Masahiko Harumoto, Kyoto (JP); and Koji Kaneyama, Kyoto (JP)
Assigned to SCREEN HOLDINGS CO., LTD., (JP)
Filed by SCREEN HOLDINGS CO., LTD., Kyoto (JP)
Filed on Apr. 13, 2021, as Appl. No. 17/228,746.
Application 17/228,746 is a continuation of application No. 15/772,218, granted, now 11,004,702, previously published as PCT/JP2016/081847, filed on Oct. 27, 2016.
Claims priority of application No. 2015-220495 (JP), filed on Nov. 10, 2015.
Prior Publication US 2021/0233784 A1, Jul. 29, 2021
Int. Cl. H01L 21/67 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/26 (2006.01); G03F 7/30 (2006.01)
CPC H01L 21/67057 (2013.01) [G03F 7/0002 (2013.01); G03F 7/0043 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/26 (2013.01); G03F 7/3021 (2013.01); G03F 7/3092 (2013.01); H01L 21/67051 (2013.01); H01L 21/6708 (2013.01); H01L 21/6715 (2013.01); H01L 21/67178 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A film processing method comprising:
discharging a metal-containing coating liquid including a metal component and a coating liquid from a processing liquid nozzle to a surface to be processed of a substrate at a process position above the substrate;
moving the processing liquid nozzle between the process position and a cleaning position farther outward than the substrate by a mover;
storing at least part of the processing liquid nozzle in a storage provided at the cleaning position;
discharging a first removal liquid for dissolving the metal component included in the metal-containing coating liquid to an outer surface of the processing liquid nozzle in the storage by a first removal liquid supplier; and
discharging pure water from a position farther upward than a position at which the first removal liquid is discharged to the outer surface of the processing liquid nozzle in the storage by a pure water supplier,
wherein the discharging a first removal liquid includes discharging the first removal liquid through a first flow path and a first opening that are formed in the storage by the first removal liquid supplier connected to the first flow path, the first flow path being directed to the outer surface of the processing liquid nozzle, the first opening being formed to be opposite to the outer surface of the processing liquid nozzle in the storage; and
the discharging pure water includes discharging the pure water through a second flow path and a second opening that are formed in the storage by the pure water supplier connected to the second flow path, the second flow path being located at a position farther upward than the first flow path and directed to the outer surface of the processing liquid nozzle in the storage, the second opening being formed to be opposite to the outer surface of the processing liquid nozzle in the storage and to be located at a position farther upward than the first opening.