US 12,117,721 B2
Lithographic apparatus and device manufacturing method
Nicolaas Rudolf Kemper, Eindhoven (NL); Sjoerd Nicolaas Lambertus Donders, Vught (NL); Joost Jeroen Ottens, Veldhoven (NL); Edwin Cornelis Kadijk, Eindhoven (NL); and Sergei Shulepov, Eindhoven (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Dec. 22, 2022, as Appl. No. 18/087,320.
Application 18/087,320 is a continuation of application No. 17/119,331, filed on Dec. 11, 2020, granted, now 11,537,038.
Application 17/119,331 is a continuation of application No. 13/187,055, filed on Jul. 20, 2011, granted, now 10,866,501.
Application 13/187,055 is a continuation of application No. 13/149,121, filed on May 31, 2011, granted, now 9,235,113.
Application 13/149,121 is a continuation of application No. 11/390,427, filed on Mar. 28, 2006, granted, now 8,027,019.
Prior Publication US 2023/0127070 A1, Apr. 27, 2023
Int. Cl. G03F 7/20 (2006.01); G03B 27/42 (2006.01); G03F 7/00 (2006.01)
CPC G03B 27/42 (2013.01) [G03F 7/70341 (2013.01); G03F 7/70716 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A movable table apparatus for a lithographic tool that comprises a projection system configured to project a beam of radiation onto a surface and a liquid supply system configured to provide a liquid to a space between an object and the projection system, the movable table apparatus comprising:
a table structure constructed to hold the object;
a drain in the table structure configured to be in fluid communication with a gap extending along at least part of a periphery of the object, when the object is held by the table structure, such that at least part of the liquid enters the drain via the gap, the drain comprising:
a chamber, and
an opening in a surface of the table, the opening configured to provide fluid communication between the chamber and the gap,
wherein the bottom of the chamber is at least 5 mm from the top surface of the object when the object is supported on the table structure.