US 12,446,405 B2
Display panel and method for preparing same and display device
Letao Zhang, Guangdong (CN); Pengfei Liang, Guangdong (CN); and Taijiun Hwang, Guangdong (CN)
Assigned to SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD., Guangdong (CN)
Appl. No. 17/599,521
Filed by SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD., Guangdong (CN)
PCT Filed Jul. 23, 2021, PCT No. PCT/CN2021/108262
§ 371(c)(1), (2) Date Sep. 28, 2021,
PCT Pub. No. WO2023/283998, PCT Pub. Date Jan. 19, 2023.
Claims priority of application No. 202110798294.7 (CN), filed on Jul. 15, 2021.
Prior Publication US 2023/0013050 A1, Jan. 19, 2023
Int. Cl. H01L 27/32 (2006.01); H10K 59/122 (2023.01); H10K 59/126 (2023.01); H10K 59/12 (2023.01); H10K 71/00 (2023.01)
CPC H10K 59/122 (2023.02) [H10K 59/126 (2023.02); H10K 59/1201 (2023.02); H10K 71/00 (2023.02)] 4 Claims
OG exemplary drawing
 
1. A method for preparing a display panel, comprising:
preparing a pixel define film on a base plate, and forming a step-shaped opening on the pixel define film using a patterning process, wherein the opening comprises a first opening and a second opening, the second opening is located on a side of the first opening that is away from the base plate, and a step surface is formed at a joint between the second opening and the first opening;
forming an organic photoresist in the opening by: forming a layer of organic photoresist on the pixel define film; and removing the organic photoresist outside the opening and a part of the organic photoresist in the second opening and retaining the organic photoresist in the first opening and a part of the organic photoresist in the second opening by means of patterning, so that a top surface of the organic photoresist in the second opening is lower than a top surface of the pixel define film, a part of a sidewall of the second opening is not covered by the organic photoresist, and the organic photoresist covers the step surface;
performing fluorinated plasma treatment on the pixel define film from the top surface of the pixel define film and from the part of the sidewall of the second opening using a fluorinated plasma gas, so that the pixel define film subjected to the fluorinated plasma treatment comprises a first pixel define layer which is hydrophilic and a second pixel define layer which is hydrophobic, wherein the second pixel define layer is disposed on a side of the first pixel define layer away from the base plate and extends from outside the second opening to inside the second opening; and
removing the organic photoresist in the opening.