| CPC H10D 30/47 (2025.01) [H01L 21/02568 (2013.01); H01L 21/445 (2013.01); H01L 21/7806 (2013.01); H10D 30/6739 (2025.01); H10D 48/362 (2025.01); H10D 62/80 (2025.01); H10D 99/00 (2025.01); H10K 10/40 (2023.02)] | 17 Claims |

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1. A two-dimensional semiconductor transistor comprising:
a gate electrode;
a gate insulating layer disposed on the gate electrode;
an organic dopant layer disposed on the gate insulating layer and comprising an organic material comprising electrons;
a two-dimensional semiconductor layer disposed on the organic dopant layer;
a source electrode disposed on the two-dimensional semiconductor layer; and
a drain electrode disposed on the two-dimensional semiconductor layer and spaced apart from the source electrode,
wherein the organic dopant layer:
comprises at least one of triphosphine, diphenylphosphide, and chlorodiphenylphosphine;
is obtained by naturally oxidizing at least one of the triphosphine, the diphenylphosphide, and the chlorodiphenylphosphine; or
comprises at least one of nicotinamide adenine dinucleotide, p-toluenesulfonic acid, dimethyl-4-phenylenediamine, tetracyanoethylene (TCNE), and trifluoroacetic acid (TFA).
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