US 12,446,142 B2
Materials and configurations for protection of objective materials
Daniel Marshall, Chandler, AZ (US); Anatoly Muchnikov, Mission Viejo, CA (US); and Sergey Vdovichev, Foothill Ranch, CA (US)
Assigned to TAE Technologies, Inc., Foothill Ranch, CA (US)
Filed by TAE TECHNOLOGIES, INC., Foothill Ranch, CA (US)
Filed on Apr. 1, 2022, as Appl. No. 17/711,298.
Claims priority of provisional application 63/170,108, filed on Apr. 2, 2021.
Prior Publication US 2023/0009459 A1, Jan. 12, 2023
Int. Cl. H05H 6/00 (2006.01); H05H 3/06 (2006.01)
CPC H05H 6/00 (2013.01) [H05H 3/06 (2013.01)] 23 Claims
OG exemplary drawing
 
1. A neutron generation generating target, comprising:
a substrate;
a neutron generation region positioned over the substrate; and
a passivation region positioned over the neutron generation region, wherein the passivation region comprises a first layer and a second layer,
wherein the neutron generation region comprises an objective material configured to generate neutrons, the first layer of the passivation region is configured to seal against diffusion of the objective material into the passivation region, and the first layer is between the second layer and the objective material, and wherein the first layer covers and extends beyond the objective material and the second layer covers and extends beyond the first layer.